John Morris

Overview

MicroVision Plus technology lies at the heart of every MKS, Spectra Products process RGA sensor and gas monitoring system. Harnessing the latest advances in RF electronics design and data acquisition electronics, the MicroVision Plus RGA delivers the levels of performance required in even the most demanding of applications. High stability operation and fast, wide dynamic range scanning allows process deviations and gas composition changes to be highlighted immediately.

The MicroVision Plus RGA offers state-of-the art electronics technology coupled with the latest in production-worthy residual gas analyser instrumentation. The MicroVision Plus RGA features "smart head" technology - the electronics unit mounts directly onto the analyser head, and connects directly to the system PC via an RS232C or RS422 interface. To meet specific applications requirements, open ion sources and UHV sources are available. The open ion source analyser is manufactured from stainless steel and high-purity alumina ceramics, and features independently replaceable twin filaments to provide built in back-up for longer operation without vacuum interuptions. In addition, the user-replaceable ion source can also be cleaned and rebuilt to maximise the lifetime of the analyser. The UHV source is based on a low thermal inertia design for fast degasing and minimal out-gassing. Incorporating a platinum source cage, it reduces the occurrence of ESD (electron stimulated desorption) peaks.

The MicroVision Plus RGA incorporates a pre-filtered quadrupole analyser as standard for contamination resistance and enhanced long term stability and high-mass sensitivity. A triple filter analyser is also available for applications where enhanced resolution and maximum high mass performance is required.
Benefits

• High stability RF and data acquisition electronics - minimum temperature related drift, fast warm-up
• Fast, wide dynamic range scanning - rapid highlighting of process deviations
• Pre-filtered analyser as standard for improved resistance to contamination and enhanced high-mass sensitivity
• Flexible I/O capability for interaction with production tools and other sensors
• Operates with RGA for Microsoft® Windows® software program
- Interactive, easy to use, comprehensive range of features
- Included data review package
- Optional simultaneous multiple-sensor operation capability
• Available with Process Eye 2000 software for:
- Advanced process recipe creation and tracking
- Decision making with alarm capabilities in recipes
- Advanced screen displays with multiple, simultaneous chart presentation
• User-serviceable design

Applications

For general residual gas analysis, the performance of MicroVision Plus, coupled to the wide range of configurations available, make it the ideal choice for many different applications, including:
• High vacuum (UHV) applications, such as vacuum coatings, accelerators and high energy physics
• Harsh environments such as high temperature and ionising radiation
• High performance
- Research and development for high mass species studies
- High resolution studies, including low molecular weight species studies and helium from deuterium studies