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Black Magic BM II Flexible 2" R&D Reactor for Carbon Nanotubes and Graphene

Part Number: BM IIProduct Details

AIXTRON‘s BM systems can operate in both thermal CVD and plasma-enhanced CVD modes, which is extremely important for controlling the structure of nanomaterials as it enables virtually all variations and morphologies of carbon nanotubes and graphene to be produced. Our systems feature fast ramp rates, automatic recipe execution, excellent uniformity and reproducibility for nanomaterial growth. The systems are based on the highly scalable showerhead concept and are available for wafer-sizes from 50mm to 300mm diameter.

  • Fast response heater, up to 1000°C/minute ramp rates
  • Interchangeable 1 inch square and 2 inch round heaters supplied
  • Thermal CVD
  • Plasma enhanced CVD
  • Excellent reproducibility
  • Automatic process control
  • Easy recipe editing
  • Integrated process camera
  • Remote operation via TCP/IP
Advanced Design
  • High plasma stability
  • Non-contaminating showerhead
  • Fast growth and processing
  • Low cost of ownership and maintenance
  • Easy cleaning
  • User accounts and access control
  • Real-time data logging
  • Consumables tracking
Additional Features
  • Extra mass flow controllers
  • Electrical feed-throughs for in-situ biasing
  • Customised gas/liquid inputs
  • Low temperature deposition
  • Mass spectroscopy
BM II 2 inch R&D: Flexible R&D Reactor for Carbon Nanotubes and Graphene brochure

Material Categories
AIXTRON brings innovative technologies in mature systems to the market. We specialise in three strategic markets that make use of our leading material coating technologies: compound semiconductors, silicon semiconductors and organic semiconductors.

Nanomaterials: incredibly small with huge benefits
The BM (Black Magic) range of systems is a turnkey solution for the production of graphene, carbon nanotubes, nanofibers and nanowires. These innovative systems are based upon thermal CVD and plasma enhanced processes. The materials produced by our BM systems can be used in a variety of applications including transistors, interconnects, flexible electronics, energy storage, thermal management, sensors and filters.

By means of our leading material-coating technologies, we are an influential, key-enabling technology provider to many emerging markets in the fields of compound, silicon, and organic semiconductors, as well as nanomaterials. For our customers, this means they have access to a wide selection of technologies for manufacturing a diverse range of devices.

Chemical Vapour Deposition and Plasma Enhanced Chemical Vapour Deposition for Nanomaterials
AIXTRON's unique plasma-based deposition technology makes the growth process very flexible and allows different nanomaterials to be produced. The plasma complements the chemical vapour deposition process and enables almost all variants and shapes of graphene, carbon nanotubes and nanowires to be synthesised, as well as lowering process temperatures and making possible different surface preparations.

Our equipment is used wherever future-oriented technologies are emerging. For example, our high-efficiency MOCVD systems serve as the basis for manufacturing LEDs, laser diodes, and solar and photovoltaic cells. And we also supply innovative production systems for high-frequency transistors and power electronics devices.

Next generation electronics using nanomaterials
We recognise the important role that new materials will play in electronics of the future. Hence, we are pushing the technological barriers in developing innovative growth technologies for the synthesis of novel materials such as graphene, carbon nanotubes and nanowires. Users of our BM systems are today developing applications, such as transistors, interconnects, flexible electronics, energy storage, thermal management, sensors and filters, based upon these new materials.

Our quality promise – certified and confirmed!
As the first supplier of MOCVD systems, AIXTRON met the strict requirements set by DIN EN ISO 9001 in 1994. In 2003 the process-oriented management system was successfully certified according to the European and international quality standard ISO 9001:2003. In 2009 the change to EN ISO 9001:2008 was made.

Conformity is confirmed by regular monitoring and reassessment audits, performed by independent certification bodies.

AIXTRON - system production with attention to detail
AIXTRON's original pioneering spirit and high quality standards still prevail to this day. We specialise in cutting-edge technologies pertaining to the deposition of materials. Precision, diligence, and attention to detail are the top priorities at AIXTRON, ensuring that our customers receive optimum system and service quality they can rely on.

Certifications at a glance
CE mark
By using the CE mark, the responsible manufacturer confirms product conformity to applicable EU guidelines and compliance with all key requirements established therein.
AIXTRON meets all of the requirements of the European CE conformity provisions for machine safety.
TÜV certification
An independent, impartial organisation in Germany that carries out safety and performance testing, as well as certification inspections.
AIXTRON systems are built to meet the highest standards.
ETL certification
An independent, impartial organisation that carries out safety and performance testing, as well as certification inspections.
AIXTRON customers can rely on the guarantee provided by the ETL system inspection symbol.
National US standard for electrical lines and components.
Most AIXTRON components are UL-certified, which means they comply with the highest standards in quality and safety.

Our promise: Sustainability
Anyone involved in developing future trends must assume responsibility for their products. Accordingly, AIXTRON’s activities always fall within the scope of the applicable European guidelines and its operations are environmentally friendly according to various norms and the US Environmental Management System (EMS).


Part Number: BM II
Heater Up to 900°C (2"), up to 1000°C (30×30mm or smaller), 1000°C/minute ramp rate
Plasma DC + pulse, 800V/2.5A/1kW, 0-100kHz
Processes Gases 3 channels, each with dual gas inputs (reducing/deposition/inert)
Substrate For small samples up to 2" diameter